Semiconductor manufacturing materials

The MicroThin Series features 1.5–5 μm ultra-thin copper foil supported by a carrier foil. It is designed for high-density, fine-line circuitry formation in advanced electronic applications

Advanced crystalize grain structure control technology delivers outstanding flexibility and durability, maintaining excellent performance even after repeated bending.

Advanced smooth surface treatment technology minimizes transmission loss in high-frequency signal applications to the greatest extent possible.

Mitsui Kinzoku's negative combines high contraction efficiency, flexible customization options, and a wide operating temperature range, delivering optimal performance across a broad range of applications.

Copper powder has excellent electrical and thermal conductivity and is one of the materials that underpin a wide range of industries, including those that use electronic materials and metallurgical powders.

Our division's metal products are used in a wide range of industrial sectors, including magnetic materials and hydrogen storage materials.

We offer a wide range of rare earth oxides and rare earth compounds.

We provide various products such as rare earth salts and fluorides, which are widely used in the fields of ceramics and electronic materials.

Tantalum oxide/tantalum niobium carbide is a compound with a high melting point and corrosion resistance. We purify it to high purity by solvent extraction and supply it for electronic ceramics, cemented carbide tools, and optical lenses.

Cerium oxide-based abrasives are used for polishing glass for LCD panels and hard disks.

Substrate abrasives for SiC wafers are high-performance polishing materials that can smooth SiC surfaces down to the atomic level in a short time.

Our proprietary technologies achieve high density and provide high-quality ITO targets with reduced nodule formation.

We manufacture and customize metal, oxide, nitride, and compound sputtering targets, including Cu, Al, Ti, Mo, In₂O₃, ZnO, SnO₂, AZO, TCO, SiN, and AlN, and propose optimal materials for displays, semiconductors, solar cells, and other PVD applications.

A next-generation ITO target that suppresses particle generation and helps stabilize the deposition process.

High-quality targets ideal for cylindrical sputtering systems that enable high-efficiency, uniform deposition.

We provide oxide semiconductor targets, with a focus on high-performance IGZO targets.

It is a solution raw material for tantalum, niobium, and other difficult-to-solve elements. It has excellent handling properties and is useful in various applications such as catalysts, film deposition, and sol-gel.

Liquid raw materials in which various metal compounds are dissolved. Unlike dispersions, no particulates are present.