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Commenced mass production and sales of new sputtering target material "WL-TCO™"
What is a Sputtering Target Material?
Sputtering target materials are essential source materials for PVD sputtering processes, enabling the deposition of thin, uniform films on substrates. They play a critical role in a wide range of applications, including displays, semiconductors, electronic devices, and optical components. Drawing on extensive experience in materials such as ITO and IGZO, Mitsui Kinzoku develops and supplies high-quality sputtering targets that support innovation in the display and semiconductor industries.
About PVD Materials Division
Manufacturing Excellence and Development Expertise
Mitsui Kinzoku's PVD Materials Division develops advanced sputtering target materials for OLED, LCD, and other advanced device applications, leveraging extensive materials expertise cultivated through decades of experience in the non-ferrous metals industry. With extensive experience in materials such as ITO and IGZO, we deliver consistent quality and reliable supply through our operations in Japan and Taiwan. Our key strength lies in our flexible development capabilities, enabling us to create tailored thin-film materials that meet the specific requirements of each customer's application.
PVD Material Products
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IGZO Targets / Oxide Semiconductor TargetsWe provide oxide semiconductor targets, with a focus on high...
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Cylindrical targetHigh-quality targets ideal for cylindrical sputtering system...
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WL-TCO™ (Next-Generation ITO Target)A next-generation ITO target that suppresses particle genera...
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Other ProductsWe manufacture and customize metal, oxide, nitride, and comp...
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ITO TargetOur proprietary technologies achieve high density and provid...
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News
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Commenced mass production and sales of new sputtering target material "WL-TCO™"