Overview
Product Overview of High-Density, High-Quality ITO Targets
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Our proprietary new manufacturing method (slurry molding technology).
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MMF method: for 3,5,7,10%-SnO2 composition
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Our high-density ITO sputtering targets are manufactured using Mitsui Kinzoku's proprietary MMF technology in combination with CIP processing. This unique approach significantly reduces nodule and particle generation, contributing to stable sputtering performance and consistent thin-film quality. We also offer flexible customization of target sizes and shapes to meet the requirements of a wide range of applications, including displays, monitors, touch panels, and solar cells.
Features and Strengths
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Suppresses particle generation
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Excellent stability
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High quality
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Helps improve yield and productivity
Application Examples
・Flat panel displays and touch panels
・Cover glass for smartphones
・Electrodes for semiconductor devices
・Transparent electrodes for solar cells
・Optical films and optical coatings
For product case studies or technical consultations, please feel free to contact us.
