Mitsui Kinzoku’s Target Technologies for High Density and Low Particle Generation
Mitsui Kinzoku’s sputtering target materials are essential materials for PVD processes used in the display and semiconductor fields.
In particular, we have extensive experience with ITO transparent conductive films for LCD and OLED panels, as well as IGZO oxide semiconductor targets, which are attracting attention for next-generation devices.
Our proprietary slurry forming technology enables high density, low particle generation, and large-size target production by suppressing the formation of nodules and particles. This helps achieve high film quality and stable deposition processes.
In addition to flat targets, we also support mass production of cylindrical targets, making our products well suited for high-efficiency deposition using advanced equipment.
Furthermore, as a manufacturer with integrated refining and recycling capabilities for indium and gallium scrap, Mitsui Kinzoku supports both the circular use of scarce resources and stable material supply, providing sustainable value to customers’ production lines.
Types of Target Materials
Sputtering target materials are classified by application into metals, oxides, and compound materials such as nitrides and carbides.
In addition to ITO transparent conductive films used in displays, IGZO oxide semiconductors, semiconductor wiring materials, and hard coating films for tools, their applications have recently expanded to film formation for perovskite solar cells.
Mitsui Kinzoku provides high-quality target materials with excellent homogeneity, high density, and composition control to meet the requirements of these diverse applications.
Target Material Manufacturing Technology Using Mitsui Kinzoku’s Proprietary MMF Method
Mitsui Kinzoku’s target materials are manufactured using our proprietary MMF method, a slurry forming process.
In this process, finely milled raw material powders are made into a slurry and formed uniformly, enabling the production of high-density target materials with fewer defects.
This process is suitable for large-size targets and complex shapes, and provides excellent film quality stability required for PVD applications using materials such as ITO and IGZO.
