Overview
Cylindrical Targets Supporting Large-Area and High-Throughput Deposition
Cylindrical sputtering targets improve film thickness uniformity and significantly increase material utilization efficiency by rotating during deposition. This has led to their widespread adoption in sputtering systems designed for large-area substrates and high-throughput manufacturing since the late 2000s.
Particularly in the Chinese market, the adoption of cylindrical sputtering systems has expanded rapidly. Their ability to reduce particle generation and extend target lifetime has made them an attractive solution for manufacturing environments that require low particle contamination and long service life.
In addition to ITO and IGZO, Mitsui Kinzoku supplies cylindrical targets in a variety of material compositions, including WL-TCO and high-mobility oxide materials. These targets enable highly uniform film deposition and stable process performance, meeting the requirements of the latest-generation sputtering equipment.
Features and Strengths
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Proprietary high-density technology
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Uniform microstructure
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Stable deposition with low particle generation
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Customizable compositions and designs to match equipment specifications
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Extensive analytical capabilities, including microstructure observation and film property measurement
Application Examples
・Flat panel displays
・Touch panels
・Automotive displays
・Solar cells
・Optical coatings
・Building material applications, including Low-E glass, functional windows, and architectural facades
・PVD coatings for automotive glass
For product case studies or technical consultations, please feel free to contact us.
