History of the PVD Materials Division
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1977
Research on transparent conductive films (ITO) began at the Central Research Laboratory.
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1980
Development of ITO targets began.
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1985
A target manufacturing plant was completed within the Miike Rare Metals Plant.
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1988
The target business was separated, and the PVD Materials Division was established.
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1999
A mass production system for ultra-high-density ITO targets (>99.5%) was established, ensuring stable supply.
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2000
A manufacturing base was established in Taiwan (Mitsui Electronic Materials Co.,Ltd.), strengthening the overseas supply system.
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2004
ISO, environmental, and safety certifications were obtained, strengthening the quality management system.
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2012
Mass production of ultra-large ITO targets with lengths of 1,000–1,400 mm began, supporting next-generation displays.
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2013
A mass production system for IGZO oxide semiconductor targets was established to meet the requirements of advanced displays.
Opened sales office at Shenzhen Branch of Mitsui Kinzoku Trading (Shanghai) Co.
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2015
The company continued to diversify target shapes and expand supply capacity, including the manufacturing, mass production, and qualification of cylindrical targets.
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2020
With two production bases in Japan and Taiwan, as well as large-scale production capacity, the company continued to provide stable supply and respond to a wide range of customer requirements.
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2025
The development structure was strengthened, including the development of WL-TCO for low particle generation and the development of high-mobility materials.
