Abrasive for SiC Substrates (NANOBIX™)
Rare Material Division

Abrasive for SiC Substrates (NANOBIX™)

Substrate abrasives for SiC wafers are high-performance polishing materials that can smooth SiC surfaces down to the atomic level in a short time.

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summary

High performance polishing slurry for SiC wafers NANOBIX™.

Since silicon carbide (SiC) single crystal is receiving attention as a material for many power devices. However, it is extremely hard and requires considerable skill and time to smoothen the surface down to the atom level.
We have succeeded in developing an abrasive that can quickly smoothen silicon carbide to utilize our time-proven technology for developing abrasives.

Features and Strengths

  1. MnO₂ abrasive grains enable high-speed and low-damage machining in a single process

  2. Possible to process C and Si surfaces with less rate difference

  3. Easy equipment cleaning/wafer cleaning

  4. Available in circulation

Examples of Uses

For SiC wafers
Two-component polishing slurry

For those who want to know more about abrasives for SiC substrates (NANOBIX™)

Please feel free to contact us for product case studies and technical consultation.

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