Conductivity

The MicroThin Series features 1.5–5 μm ultra-thin copper foil supported by a carrier foil. It is designed for high-density, fine-line circuitry formation in advanced electronic applications

High-performance materials for embedded capacitors, supporting improved electrical performance and higher circuit integration.

Advanced crystalize grain structure control technology delivers outstanding flexibility and durability, maintaining excellent performance even after repeated bending.

Advanced smooth surface treatment technology minimizes transmission loss in high-frequency signal applications to the greatest extent possible.

Although oxides are generally insulators, they can become conductive when small amounts of other elements are added. It is primarily used in transparent conductive films and electronic devices.

This is a fine powder of an alloy made from a base of tin with added silver, copper, bismuth, and other elements. It is the most common bonding material used to join electronic components electrically and mechanically.

Copper powder has excellent electrical and thermal conductivity and is one of the materials that underpin a wide range of industries, including those that use electronic materials and metallurgical powders.

Our division's metal products are used in a wide range of industrial sectors, including magnetic materials and hydrogen storage materials.

Tantalum oxide/tantalum niobium carbide is a compound with a high melting point and corrosion resistance. We purify it to high purity by solvent extraction and supply it for electronic ceramics, cemented carbide tools, and optical lenses.

This is a conductive fine Ceramics with a high melting point and high hardness. It offers excellent wear and corrosion resistance and performs well in high-temperature, high-load environments.

We manufacture and customize metal, oxide, nitride, and compound sputtering targets, including Cu, Al, Ti, Mo, In₂O₃, ZnO, SnO₂, AZO, TCO, SiN, and AlN, and propose optimal materials for displays, semiconductors, solar cells, and other PVD applications.

A next-generation ITO target that suppresses particle generation and helps stabilize the deposition process.

High-quality targets ideal for cylindrical sputtering systems that enable high-efficiency, uniform deposition.

We provide oxide semiconductor targets, with a focus on high-performance IGZO targets.

Our proprietary technologies achieve high density and provide high-quality ITO targets with reduced nodule formation.